Since 2022, Russia-Ukraine geopolitical conflicts have intensified, and global energy prices have risen sharply, with international natural gas prices hitting historic highs. As the most important transitional energy source in the transition from fossil energy to non-fossil energy, the share of natural gas in primary energy has increased from 14.6% in 1965 to 24.7% in 2020.  The global gas price indices showed a unilateral downward trend from 2018, bottomed out in 2020, and remained low for a long time. However, since July 2020, the global gas prices have gradually fluctuated upward, and the impact of geopolitical events made the Dutch TTF gas price even hit record highs repeatedly.

An analyst of a securities company believes that the core catalyst of this round of global gas market lies in the lack of investment in upstream oil and gas resources caused by long-term low prices. Since 2020, although the epidemic has led to a decline in demand, the decline in supply has been faster, resulting in a large inventory consumption. In 2021, demand will recover faster than supply (the supply-side is less sensitive to prices, which will be reflected in investment).  

As the world's two largest gas TiSi2 Powder are also expected to change significantly.

About Titanium Silicide TiSi2 Powder:
With the rapid development of large integrated circuits (ULSI), the size of the equipment and equipment is getting smaller, the requirements for equipment size, film quality, and thickness uniformity are getting higher.
At present, the wire width of the semiconductor device has been reduced to less than 0.1 μm, so it is impossible to obtain a continuous conductor having a low resistance during the original process.
New materials, new processes, and new deposition systems must be found to improve or replace aluminum and heavy-doped polysilicon for circuit metallization.
In these new materials, metal silicon having high conductivity and high-temperature stability has increasing interest, compatible with the current microelectronic manufacturing process. Titanium Disilicide has low resistivity, high temperature and good stability.
In a commonly studied metal silicide (such as TSI2, Nisi, Cosi2, WSI2, Tasi2, MOSI2), silicide (Tisi2) has ideal characteristics: high conductivity, high selectivity, good thermal stability, good SI Adsorption, good process adaptation of silicon adaptive connection parameters. Therefore, in the integrated circuit device, titanium silicide is widely used to produce a metal oxide semiconductor (MOS), a metal oxide semiconductor field-effect transistor (MOSFET) and a dynamic random access memory (DRAM) gate, source/leakage, mutual contact ohm. Feel free to send an inquiry to get the latest price if you would like to buy Titanium Silicide TiSi2 Powder in bulk.

Characteristics of Titanium Silicide TiSi2 Powder:
Titanium silicide TiSi2 powder (CAS 12039-83-7) has a high melting point, high corrosion resistance, high oxidation resistance, good electrical conductivity, high temperature ductility, a binary alloy systemthe intermediate phase.

Technical Parameter of Titanium Silicide TiSi2 Powder:

Product Name	MF	Purity	Particle Size	Melting Point	Density	Color
titanium silicide	TiSi2	99%	5-10um	1620℃	4.0 g/cm3	black

Chemical Composition of Titanium Silicide TiSi2 Powder:

TiSi2	Ti	Si	C	P	Fe	S
＞99%	46.32%	52.5%	0.02%	0.02%	0.19%	0.01%

How is Molybdenum Silicide MoSi2 Powder produced?
Di silicide can be obtained from the reaction between titanium or hydride and silicon.
Ti + 2 Si → Tisi2
Aluminum heat can also be performed by the ignition of aluminum powder, sulfur, silica and titanium dioxide or hexafluoritititoetice, by electrolysis of hexafluoride titanate and titanium dioxide, or through tetrachloride reaction.
Another method is to react with titanium tetrachloride to silane, dichloronilane or silicon.
TiCl4 + 2 SiH4 → Tisi2 + 4 HCl + 2 H2
TiCl4 + 2 SiH2Cl2 + 2 H2 → Tisi2 + 8 HCL
TiCl4 + 3 Si → Tisi2 + SiCL4
 
Applications of Molybdenum Silicide MoSi2 Powder:
Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistor connections. In the microelectronic industry, it is typically used in the C54 phase.
1. Silicide Titanide is low, the melting point is high, and the chemical properties are stable, and there is a broad use prospect in the microelectronics field.
2. Aerospace industry, ship submarine manufacturing, medical, jewelery manufacturing.

Packing & Shipping of Titanium Silicide TiSi2 Powder :
We have many different kinds of packing which depends on the titanium silicide TiSi2 powder quantity.
Titanium silicide TiSi2 powder packing: vacuum packing, 100g, 500g or 1kg/bag, 25kg/barrel, or as your request.
Titanium silicide TiSi2 powder shipping: could be shipped out by sea , by air, by express as soon as possible once payment receipt.

 

Titanium Silicide Properties
Other Names	TiSi2 powder, titanium disilicide
CAS No.	12039-83-7
Compound Formula	TiSi2
Molecular Weight	104.04
Appearance	Black Powder
Melting Point	1470 °C
Boiling Point	N/A
Density	4.02 g/cm3
Solubility in H2O	N/A
Exact Mass	103.9018
Titanium Boride Health & Safety Information
Signal Word	N/A
Hazard Statements	N/A
Hazard Codes	N/A
Risk Codes	N/A
Safety Statements	N/A
RTECS Number	N/A
Transport Information	N/A
WGK Germany	N/A

The current international situation is highly uncertain, and its economic impact has not been able to be assessed properly. In addition, rising energy and commodity prices and supply chain disruptions are expected to push the price of the TiSi2 Powder higher.

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