Titanium Sputtering targets are used frequently in flat display coatings, hardware tool coating, decorative coat, semiconductor components and for melting down of silicon. This is also one the key materials used to make integrated circuits.

High Purity Titanium Suttering Target:
Standard:
ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911

Properties:
Titanium sputtering targets are made from titanium metal. This is a strong and lightweight material that is well-respected for its strength-to-weight ratio. Titanium metal, a heavy metal that has low density is very ductile in oxygen-free conditions. This makes it shiny, metallic-white and lustrous. Because it has a high melting temperature (more than 1,650 degrees Celsius or 3,000 degrees Fahrenheit), this metal is useful for refractory purposes. Paramagnetic with low electrical and thermal conductivity, it is also paramagnetic.

Application:
This is mainly used to display flat panels, DRAMS, integrated circuits and flat panel applications.

Transportation & Payments:

Steel Alloy High Purity Ti Titanium Sputtering Target Property
Other Titles	The Titanium sputtering goal
	N/A
Compound Formula	Ti
Molecular Weight	N/A
Appearance	N/A
Melting Point	N/A
Water solubility	N/A
Density	N/A
Purity	99.6%
Size	Individualized
Boling Point	N/A
Specific Heat	N/A
Thermo Conductivity	N/A
Thermal Expansion	N/A
Young's Module	N/A
Exact	N/A
Monoisotopic	N/A
Steel Alloy Titanium Sputtering High Purity Target Health & Safety Information
Safety Notice	N/A
Hazard Statements	N/A
Flashing Point	N/A
Hazard Codes	N/A
Risk Codes	N/A
Safety statements	N/A
RTECS #	N/A
Transport Information	N/A
WGK Germany	N/A

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