High Purity Cobalt Silicide CoSi2 Powder CAS 12017-12-8, 99%

Cobalt Silicide CoSi2 Pulver :
Cobalt Silicide Intermetallic compounds, silicates of cobalt. It's a superconductor that has a Ca temperature transition. Cobalt disilicide Formulation of a chemical substance CoSi2 Dark brown rhombic crystalline. Molecular weight: 115.11.Relative density: 5.3. You can oxidize it at 1200 to remove its surface. It reacts with fluorine and chlorine at low temperatures. Also, attack by hydrogen fluoride and dilute concentrated nitric acids and sulfuric acids. Molten strong alkali can also violently destroy it. You can slow it down by boiling concentrated hydrochloric.
CoSi2 powder The contact is low in resistivity and has good thermal stability. It's widely used to make large-scale integrated Circuit contacts. Also CoSi2 Has a crystal structure similar to Si. It can also form an epitaxial CoSi2/Si arrangement on Si substrate. This structure is used for study of the interface characteristics in epitaxial silicon metallic.

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Cobalt Silicide CoSi2 Pulver Characteristics:
Cobalt silicide CoSi2 Powder (CAS12017-12-8) has a high melting temperature, high corrosion resistance.

Technical Parameters of Cobalt Silicide CoSi2 Pulp:

Name of Product	MF	Purity	Particle size	Melting Point	Density	The color of the sky
Silicide of cobalt	CoSi2	99%	5-10um	1277	5.3 g/cm3	Black

It is simple. Cobalt Silicide CoSi2 Powder produced?
Cobalt diicide manufacturing is generally done by first creating a metal cobalt layer (CO) on a silicon substrate. Then, after two annealing processes to convert cobalt from Cobalt silicicide to Cobalt disilicide, it's possible to make the cobalt layer. First, annealing involves diffusion of small amounts of cobalt onto a siliceous substrate in order to create a cobalt silicate layer (COSi). Second, to make the Cobalt disilicide (with a lower resistance) from the cobalt-silicate layer is an annealing procedure.

Cobalt Silicide CoSi2 Pulver :
Cobalt Silicide CoSi2 Pulp is used in optoelectronics, electronics, and lasers.
The potential for silica nanostructures has many important applications. Silicon silicide (FeSi2) is a semiconductor silicide that can be used to create nano-electronic active device. Metal silicides (CoSi2, NickelSi2) are able to be used as nanowires in the future quantum computer and fault-tolerant, terahertz-nanocircuit computers. The ability to prepare epitaxial silicon silicide conductors on silicon substrates will greatly improve their performance compared to ordinary metal nanowires. At the internal electrical connection points, such as drain, source and gate, low-resistance Cobalt disilicide layers (CoSi2) are created.

Shipping Cobalt Silicide CoSi2 Pulver:
There are several types of packaging that can be used depending on the amount of cobalt Si2 powder.
Packaging of cobalt silicide COSi2 powder: You can vacuum pack 1kg/bag, 25kg/barrel or according to your requirements.
Delivery of powder Cobalt silicide COSi2: After receipt of payment, items may be shipped by sea, air or express.


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